Archive for May, 2010

May 03 2010

Mentor Inroute – finally a useful technology merger

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Mentor Graphics announced their InRoute product today which is thier Olympus Router with Calibre.  Unlike prior products from various vendors which use a Place and Route tool and tech file with an API interface to the PV (DRC, LVS, ERC, xRC, CAA, OPC, etc) environment, this is Mentor’s version of the common datamodel solution.  What makes this product interesting is the integration of a “gold standard” PV tool into a P&R environment, so the user does not have to bother with the misdirected checks from the P&R tool.
Traditionally, the P&R environments are grid based tools (even the shape based and gridless [really small grid, but grids none-the-less] ones) which have design rules for the interconnect layers defined along the lines of what is a movable object or edge by the P&R tool.  This covers about 10-15% of a typical PV runset and does not include complex, context based rules that are required for sub-90nm processes.  Several vendors have released P&R products that are integrated with their PV tools and can provide interconnect checks and object correction / adjustment based on the rules available in their runsets.  Most of these runsets, while qualified with the foundries, are NOT the signoff decks, and are not complete for covering the full layer set rules, reliability & yield rules, OPC/masking and double patterning rules, fill and CMP rules.  The Inroute integration, by virtue of supporting the Calibre engine, will eventually include all of these modules, as well as have the capability to “auto-correct” them for objects created by the P&R tool.
The product at this time is supporting the DRC engine in basic SVRF form.  This removes the need to code the based design rules into the P&R tool tech file for setup, the foundry supplied signoff approved DRC decks will serve as the technology file base for the router.  The flow for completion of a chip still requires full chip PV with standalone Calibre, as the final chip will generally contain IP portions that are not created with the P&R tool.  Future releases will incorporate the eqDRC portion of the engine, as well as the PERC engine and hierarchical LVS.  For now, there is at least one tool that does not require a double setup and learning curve to be able to perform deep sub-wavelength routing that is double-pattern and immersion litho compatible.
PC

Mentor Graphics announced their InRoute product today which is thier Olympus Router with Calibre.  Unlike prior products from various vendors which use a Place and Route tool and tech file with an API interface to the PV (DRC, LVS, ERC, xRC, CAA, OPC, etc) environment, this is Mentor’s version of the common datamodel solution.  What makes this product interesting is the integration of a “gold standard” PV tool into a P&R environment, so the user does not have to bother with the misdirected checks from the P&R tool.

Traditionally, the P&R environments are grid based tools (even the shape based and gridless [really small grid, but grids none-the-less] ones) which have design rules for the interconnect layers defined along the lines of what is a movable object or edge by the P&R tool.  This covers about 10-15% of a typical PV runset and does not include complex, context based rules that are required for sub-90nm processes.  Several vendors have released P&R products that are integrated with their PV tools and can provide interconnect checks and object correction / adjustment based on the rules available in their runsets.  Most of these runsets, while qualified with the foundries, are NOT the signoff decks, and are not complete for covering the full layer set rules, reliability & yield rules, OPC/masking and double patterning rules, fill and CMP rules.  The Inroute integration, by virtue of supporting the Calibre engine, will eventually include all of these modules, as well as have the capability to “auto-correct” them for objects created by the P&R tool.

The product at this time is supporting the DRC engine in basic SVRF form.  This removes the need to code the based design rules into the P&R tool tech file for setup, the foundry supplied signoff approved DRC decks will serve as the technology file base for the router.  The flow for completion of a chip still requires full chip PV with standalone Calibre, as the final chip will generally contain IP portions that are not created with the P&R tool.     For runtime performance, the tool can go out and grab existing Calibre licenses available on the system, if desired.

Future releases will incorporate the eqDRC portion of the engine, as well as the PERC engine and hierarchical LVS.  For now, there is at least one tool that does not require a double setup and learning curve to be able to perform deep sub-wavelength routing that is double-pattern and immersion litho compatible.

PC

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