Apr 09 2009
ebeam initiative – a mfg solution that starts with a design flow
A new industry initiative (www.ebeam.org) has been brought to the design marketplace focusing on a cost effective solution to the low/mid volume and prototype requirements on cutting edge deep sub-wavelength processes (90nm and below). The managing sponser company D2S, Inc has brought together a strong initial partner/member base, a strong leadership group, and a very directly focused goal for the group. Aki Fujimura (EDA veteran most recently from C-Level positions at Cadence and Simplex Solutions) has organized a group with the simple focus of creating a design and supply chain for prototype manufacturing without masks that starts with optimized design data and software, and goes through a modified data fracture environment to direct write of wafer via e-beam on new optimized fabrication equipment.
Based on the directed focus of the initiative, the dramatically increased cost of masking and fabrication of sub 90nm processes, and the current world economic situation, all aspects of the design flow have chosen to participate from the initial stages. These partners can all be found at http://www.ebeam.org/members. The group has already started a 65nm prototype as proof of concept on the flow back in Oct 2008, and the run is a collaborative effort of the partners D2S, eSilicon and Fujitsu.
A change in this design solution, is rather than being an after-the-fact DFM correction flow, the design starts with IP that is optimized for the fracture routines and the design patterning optimization of the direct write e-beam equipment. As such, the level of optimization sought and can potentially be provided is well beyond that of any single point in the flow optimization solution. Several differentiating aspects from other “DFM like” programs is the inclusion of members such as Tela Innovations and Altos Design, which are in place to validate the usability of the design IP for both the customers and in real tool applications.
To help bring structure and organization to the initiative, they have enlisted the services of another multi-disciplinary veteran, Jan Willis, as the initiative facilitator. Jan is well known form her work at Cadence on the industrial relations/partnering side and as facilitator for the the X-Initiative.
The program is targeting an anticipated design throughput by the end of 2009, of 1 direct write wafer/hour using the proper design libraries, VSB (variable shaped beam) fracture and CP (character projection) fracture on the newly design equipment and flow. This is definitely a program to keep track of, as the solution can mean high 6 figures/low 7 figures of cost savings per design using a direct write methodology over a masking and MPW prototype flow.
PC