Sep 25 2008
Litho progress for 22nm – IBM / Mentor / et al
Progress on the realization of 22nm wafer fabrication has moved a step closer with the new joint development program between IBM, Mentor Graphics and Toppan Photomask. Coordinated out of the IBM East Fishkill facility (Hudson Valley area of NY) advanced development of a new approach for optical resolution of the critical masking operations for the 22nm node is progressing. The direction be targeted is bringing advanced computing skills to the semiconductor manufacturing ecosystem, not just the design phase utilizing DFM and traditional mask preparation tools.
The IBM facility is a current 140,000 sq. ft, approx 4000 wafer/week 300mm facility with an in progress of being configured 72,000 sq. ft annex. The main fab floor is for 130nm, 90nm, and 65nm production at this time. The annex is in phase 1 at this time and is supporting a mix of 65nm/45nm production and 45nm/32nm process development in approx 40,000 sq. ft. Phase 2 will be the balance of 32,000 sq ft and be targeted for 32nm manufacturing and 22nm development. Process and lithography development down to the 15nm node is being done at their partner facility the College of Nanoscale Science and Engineering at the University of Albany.
The new method is based on expanding some technical and business concepts: (1) computational lithography (CL) which incorporating a manufacturing tool control called Source Mask Optimization (SMO) with Mentor Graphics and Toppan Photomask; (2) exploring development options and strategies through a TCAD based virtual fab in conjunction with Rensselaer Polytechnic Institute (RPI) and (3) design technology co-optimization that is identifying directly measurable manufacturing rules and techniques as a joint effort between Mentor and IBM.
The CL portion is an extension of the existing DFM flow which has focused on just physical design database adjustments using OPC and other traditional MDP products. Mentor has already demonstrated the expansion of their Calibre products to support distributed. multi-threaded, multi-core and other high capacity compute environments. The advanced development work with IBM will include fundamental research on applications with GPUs, the IBM Cell BE processor, and other engines that may be used in a cloud computing or supercomputer environment. The need for this is to provide rapid turnaround on the complex problem solving for the new imaging simulations. The main ideal of the new CL was to develop a method of providing lithographic solutions for specific areas of the chip being processed fast enough to be usable on the factory floor.
This manufacturing floor solution would be coupled with in development, but yet to be available 22nm masking equipment, that can use a programmable or variable light source. Current masking equipment uses fixed illumination sources for an entire reticle area. The added flexibility of SMO would allow for function specific and portions of the reticle (e.g. memory cores, control logic, high speed paths) to not only be optimized with traditional DFM tools, but also add the new dimension of source style (single point, dipole, quad, etc) in order to allow for imaging the 22nm process. This SMO will reduce the high amount of complexity of the data on the mask, and shift some of the complexity to the masking equipment and the light source. The impact will now be both mask and source simulation data processing. Toppan Photomask is participating in this portion of the program to help incorporate constraints on the reticle preparation, use and defect inspection & repair.
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